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SPECIAL FEATURE
- The SMART RTCVD is an advanced chemical vapor deposition process development tool for the University or Industrial Researcher.
It is controlled by our proprietary real-time, Labview based process control software that provides recipe driven process control, real-time graphing and automatic data logging for optimal process reproducibility.
The RTCVD communicates with a PLC that handles the hardware interface and provides the appropriate industrial level safety systems. The system has a standard Web interface connection that allows for remote training, software upgrades and system trouble shooting. 
CONFIGURATION
PERFORMANCE
Number of zone
2 Zone
Heater
Kantal type
Heating zone size
Dia.60 x 500 (mm)
Uniformity zone
120㎜ [< 1%]
Max temperature
Max 1150℃
Max speed temp.
13℃/min
Sample loading
Mini Slide type
Move
Furnace auto moving type
Moving stroke
400mm
Moving speed
30mm/sec
Gas
MFC control
Control
Semi auto control by touch PC
Dimension
1800 (H) x 1250(W) x 810(D) (mm)
- APPLICATIONS
- - Graphene growth
- - ZnO growth
- - Material research
- - Nano material R&D
- - Compound semiconductor
- - Oxide material R&D
- - Ferroics materials
- - Device fabrication
- THE SMART RTCVD IS USED FOR NANOTECHNOLOGY AND DEVICE APPLICATIONS.
- - Professional installation available
- - Personalized training available
- - Real-time support
- - Our systems scale to meet your production requirements
- - We believe in customers for life
- - World wide support network
