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SPECIAL FEATURE
- The INTELLIGENT RTCVD System is an advanced Chemical Vapor Deposition process development tool for the University or Industrial Researcher.
The RTCVD communicates with a PLC that handles the hardware interface and provides the appropriate industrial level safety systems. 
CONFIGURATION
PERFORMANCE
Max temperature
Max 1000℃
Working temperature
Max 900℃
Uniformity zone
150㎜ [< 2%]
Rapid thermal up speed
180℃/min
Cooling speed
50℃/min
Number of zone
1Zone
Number of zone
Dia.300 x 650 (mm)
Quartz size
Dia.80 x 900(mm)
Heater
Halogen lamp
Gas
MFC control
Dimension
950(L) x 550(D) x 1343(H) (mm)
- APPLICATIONS
- - Graphene growth
- - ZnO growth
- - Material research
- - Nano material R&D
- - Compound semiconductor
- - Oxide material R&D
- - Ferroics materials
- - Device fabrication
- THE INTELLIGENT RTCVD IS USED FOR NANOTECHNOLOGY AND DEVICE APPLICATIONS.
- - Professional installation available
- - Personalized training available
- - Real-time support
- - Our systems scale to meet your production requirements
- - We believe in customers for life
- - World wide support network
