- 현재위치 : 홈 > 제품안내 > 제품
SPECIAL FEATURE
- - l2~4 inch magnetron sputter
- - l<±5 % in 4inch area film thickness uniformity
- - lMax 950 ℃ heating temperature on substrate
- - l<±5 % in 4 inch area heating uniformity
- - lUp or down gun type
- - lRF / DC power supply
CONFIGURATION
PERFORMANCE
Sputter gun
4” single (2” Dual or Triple)
Substrate heater
Max 950 ℃
<±5 % in 4 inch areaUltimate pressure
< 5-6 torr in 15 min.
RF power
300W
Pulsed DC power
Option
TMP
300 l/s
Mechanical pump
200 L/min
Substrate rotation
20 RPM
Gas
MFC control
Dimension
900(L) x 850(D) x 1600(H)(mm)
- APPLICATIONS
- - lMetal & oxide coating
- - lPt, Ti, Cu, Al and other metals
- - lVO2, ZnO, AZO, GZO, TiO2, SiO2 and other oxide materials
- - lNovel metal coating
- - lSEM sample preparation
- - lMaterial research
- - lNano material R&D
- - lCompound semiconductor
- - lOxide material R&D
- - lFerroics materials
- THE TERALEADER DIFFERENCE
- - Save space
- - Cost efficient operation
- - Uniform film thickness
- - Short pump down cycles
- - Powerful control system
