CONFIGURATION |
PERFORMANCE |
---|---|
Sputter gun |
4¡± single (2¡± Dual or Triple) |
Substrate heater |
Max 950 ¡É |
Ultimate pressure |
< 5-6 torr in 15 min. |
RF power |
300W |
Pulsed DC power |
Option |
TMP |
300 l/s |
Mechanical pump |
200 L/min |
Substrate rotation |
20 RPM |
Gas |
MFC control |
Dimension |
900(L) x 850(D) x 1600(H)(mm) |