TERA LEADER / RESEARCH EQUIPMENT
Mini CVD
Compact furnace for thermal annealing and chemical vapor deposition
The TLP1008 series is a compact split-type tube furnace for controlled thermal processing in materials research.
Confirm the applicable model, options and final specifications before ordering.
Features
- The TLP1008 series is a compact split-type tube furnace designed for precision heating applications up to 1100 °C. Its design supports controlled thermal processing for chemical vapor deposition (CVD) and related experiments.
Specifications
| Model | TLP-1008-MF (Mini furnace type) |
|---|---|
| Power Consumption | 2 kW |
| Input Voltage | AC220V |
| Temperature | 1100ºC Max. for < 1hr / 900ºC for continuously heating |
| Heating Zone | Total heating zone length: 184mm |
| Uniformity zone | 60mm (+/-1°C) @ 900 °C |
| Gas control | Flow meter, MFC(*option) |
| Dimension | 465 x 445 x 515 (Open position: 540(H)) |
Confirm the final model-specific specification and options before ordering.
Options
- Vacuum Gauge
- MFC (with Digital Read-out Unit)
- Vacuum pump
Applications
- Thermal Annealing
- Chemical Vapor Deposition
Product images
Downloads
No public downloads are listed for this product. Contact us for applicable documents.